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You are here: Home / Publications / Carbon nano dots scale by focused ion beam system for MIS diode nano devices

Carbon nano dots scale by focused ion beam system for MIS diode nano devices

October 3, 2012 By Editor

Abstract – Metal-insulator-semiconductor (MIS) structures with a nanocrystal carbon (nc-C) embedded in SiO2 thin films were fabricated using a focused ion beam (FIB) system with a precursor of low-energy Ga+ ion and carbon source. The crystallinity of nc-C was investigated by Raman spectroscopy and atomic force microscopy (AFM). Raman spectra indicate the evidence of crystallization of nc-C after annealed at 600˚C by the sharp peak at 1565 cm-1 in graphite (sp2), while no peak of diamond (sp3) could be seen at 1333 cm-1. The AFM images showed the nc-C dots controlled with diameter of 100 nm, 200 nm and 300 nm, respectively. The above results revealed that the nc-C dots had sufficiently stuck onto SiO2 films. The hysterisis loop in the capacitance–voltage characteristics appeared in the MIS device with SiO2/nc-C/SiO2 structure in which voltage shift is 0.32 V for radical oxidation and 0.14 V for dry oxidation, respectively.

Keywords – Carbon; Nanocrystal; Memory device; Focused ion beam; Raman spectroscopy; Atomic force microscopy

Corresponding Author: Ruslinda Abdul Rahim
Corresponding Author’s Email: ruslinda@unimap.edu.my

Full text: PDF

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Filed Under: Publications Tagged With: Atomic force microscopy, Carbon, Focused ion beam, Memory device, Nanocrystal, Raman spectroscopy

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