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You are here: Home / Publications / Nanogaps Formation Using Scanning Electron Microscope (SEM) Based E-Beam Lithography (EBL) Technique

Nanogaps Formation Using Scanning Electron Microscope (SEM) Based E-Beam Lithography (EBL) Technique

July 17, 2014 By Editor

Abstract – The semiconductor industry and wafer fabrication developments are driven by customer’s needs. Customers require faster, more reliable and lower cost chips. To achieve this, chip manufacturers and researchers have learned to reduce the size and dimension of component on the chip. The physical dimension of a feature on the chip is referred to as the feature size.[…]

Keywords – semiconductor, fabrication

Corresponding Author: Mohammad Nuzaihan Md Nor
Corresponding Author’s Email: m.nuzaihan@unimap.edu.my

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Filed Under: Publications Tagged With: fabrication, semiconductor

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